Title: A system built for both deterministic transfer processes and contact photolithography

Abstract: A home-built compact system that functions as both a transfer stage for deterministic transfer processes and a mask aligner for contact photolithography, is constructed. The precision translation and rotation sample stage and optical microscope are shared between the two modes. In the transfer mode, equipped with a heating element, the setup has been used to deterministically transfer freestanding semiconductors, 2D materials, and van der Waals electrodes. Moreover, with an upgrade cost of less than $1000, an existing transfer stage can be configured into a contact mask aligner. Photolithography patterns with feature sizes of ~1-2 um have been achieved when combining a chromium photomask and a thin photoresist layer, comparable to the performance of an entry level mask aligner such as MJB3 (Karl Suss). Our prototype instrument provides an exciting and affordable solution for preforming high quality deterministic transfer and photolithography processes on one single tool in house.